Recent Advances in Thin Films Deposited by Vacuum Methods
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".
Deadline for manuscript submissions: closed (20 May 2024) | Viewed by 11936
Special Issue Editors
Interests: materials engineering; surface engineering; nanomaterials; thin films; solar cells
Special Issues, Collections and Topics in MDPI journals
Interests: materials engineering; nanomaterials; polymers; solar cells
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
Techniques for depositing thin films make it possible to refine the surface layer of the element, ensuring the required functional properties, while possibly using cheap materials for its core. Among the many techniques increasing the functional properties of engineering materials surfaces, vacuum methods play an important role in industrial practice. The use of vacuum thin film deposition methods enables research and development work on modern material technologies, in which nanotechnology plays a key role. Research areas considered strategic and of higher priority, i.e. medicine and energy production from renewable sources, are of particular interest. This Special Issue will serve as a forum for papers covering the following concepts:
- Theoretical and experimental research, knowledge and new ideas in vacuum thin film deposition methods;
- Recent developments in multi-functional inorganic thin films;
- Thin films produced by different processes, including chemical vapour deposition (CVD);
- Physical vapour deposition (PVD) and atomic layer deposition method (ALD);
- The use of thin films deposited by vacuum methods in the field of optics, electronics, photovoltaics and medicine.
Dr. Marek Szindler
Dr. Magdalena M. Szindler
Guest Editors
Manuscript Submission Information
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Keywords
- surface engineering
- thin films
- nanomaterials
- vacuum methods
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