materials-logo

Journal Browser

Journal Browser

Advanced Plasma Technology in Material Synthesis, Processing and Analysis

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Manufacturing Processes and Systems".

Deadline for manuscript submissions: closed (20 November 2024) | Viewed by 5061

Special Issue Editors


E-Mail Website
Guest Editor
Chemistry of Surfaces, Interfaces and Nanomaterials (ChemSIN), Université libre de Bruxelles, 1050 Brussels, Belgium
Interests: plasma sources; plasma diagnostics; plasma-assisted gas conversion and material synthesis; plasma–liquid interactions; plasma-based coatings; surface modification

E-Mail Website
Co-Guest Editor
GREMI Laboratory, University of Orléans, Orléans, France
Interests: plasma physics; nanotechnologies; material characterization; thin film deposition

E-Mail Website
Co-Guest Editor
Plasma Science and Technology Lab, Department of Electrical & Electronic Engineering, University of Rajshahi, Rajshahi 6205, Bangladesh
Interests: plasma source design, plasma agriculture; plasma medicine; plasma materials processing

Special Issue Information

Dear Colleagues,

In recent decades, plasma-assisted material processing has employed by researchers because it has a wide range of processing capabilities, including the synthesis of new materials, as well as the deposition and etching of materials, where it can be used to synthesize and modify both organic and inorganic materials.  In view of the fact that plasma source parameters control its properties, they offer a highly controlled method of dry material processing, and therefore, it can be considered to be an environmentally friendly manufacturing process. So, plasmas have been used for advanced material processing, such as nanomaterial synthesis; catalyst synthesis; coating, polymer, and carbon material manufacturing; energy and additive material processing; and biomedical and toxic waste management, etc. Plasma-based material processing techniques are continuously being improved by researchers in order to gain insights, optimize, and scale up the process for the creation of novel materials and surface modification.

The aim of this Special Issue is to describe state-of-the-art plasma-based material processing by understanding the underlying mechanisms and correlating properties using a variety of diagnostic tools. In addition to atmospheric and low-pressure plasma-assisted techniques, some new plasma technology systems are used for the synthesis of nanomaterials into liquid solutions.

This Special Issue welcomes contributions that explore novel materials, processes, and surface analysis using different plasma sources.

Dr. Nepal Chandra Roy
Dr. Cédric Pattyn
Prof. Dr. Mamumur Rashid Talukder
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • plasma material processing
  • plasma polymers
  • plasma-assisted carbon materials
  • plasma nanomaterials
  • surface treatment
  • biomaterials
  • energy materials

Benefits of Publishing in a Special Issue

  • Ease of navigation: Grouping papers by topic helps scholars navigate broad scope journals more efficiently.
  • Greater discoverability: Special Issues support the reach and impact of scientific research. Articles in Special Issues are more discoverable and cited more frequently.
  • Expansion of research network: Special Issues facilitate connections among authors, fostering scientific collaborations.
  • External promotion: Articles in Special Issues are often promoted through the journal's social media, increasing their visibility.
  • e-Book format: Special Issues with more than 10 articles can be published as dedicated e-books, ensuring wide and rapid dissemination.

Further information on MDPI's Special Issue polices can be found here.

Published Papers (3 papers)

Order results
Result details
Select all
Export citation of selected articles as:

Research

14 pages, 24410 KiB  
Article
Characteristics of Merging Plasma Plumes for Materials Process Using Two Atmospheric Pressure Plasma Jets
by Sang Un Jeon, Jae Wan Kim, Hyun-Young Lee, Gyoo-Cheon Kim and Hae June Lee
Materials 2024, 17(19), 4928; https://doi.org/10.3390/ma17194928 - 9 Oct 2024
Viewed by 623
Abstract
Atmospheric pressure plasma jets (APPJs) have attracted significant attention due to their ability to generate plasma without vacuum systems, facilitating their use in small areas of plasma processing applications across various fields, including medicine, surface treatment, and agriculture. In this study, we investigate [...] Read more.
Atmospheric pressure plasma jets (APPJs) have attracted significant attention due to their ability to generate plasma without vacuum systems, facilitating their use in small areas of plasma processing applications across various fields, including medicine, surface treatment, and agriculture. In this study, we investigate the interaction between two helium plasma jets, focusing on the effects of varying flow rate, voltage, and directional angle. By examining both in-phase and out-of-phase configurations, this research aims to elucidate the fundamental mechanisms of plasma plume merging, which has critical implications for optimizing plasma-based material processing systems. We demonstrate that while increasing voltage and flow rate for the in-phase condition leads to an extended plasma plume length, the plumes do not merge, maintaining a minimal gap. Conversely, plasma plume merging is observed for the out-of-phase condition, facilitated by forming a channel between the jets. This study further explores the impact of these merging phenomena on plasma chemistry through optical emission spectroscopy, revealing substantial differences in the emission intensities of OH, the second positive system of N2, and the first negative system of N2+. These findings offer valuable insights into controlling plasma jet interactions for enhanced efficiency in plasma-assisted processes, particularly where plume merging can be leveraged to improve the treatment area and intensity. Full article
Show Figures

Figure 1

9 pages, 1472 KiB  
Article
Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasma
by Sanghyun You, Eunjae Sun, Heeyeop Chae and Chang-Koo Kim
Materials 2024, 17(16), 3917; https://doi.org/10.3390/ma17163917 - 7 Aug 2024
Viewed by 2676
Abstract
This study explores the impact of varying discharge gas compositions on the etching performance of silicon carbide (SiC) in a heptafluoroisopropyl methyl ether (HFE-347mmy)/O2/Ar plasma. SiC is increasingly favored for high-temperature and high-power applications due to its wide bandgap and high [...] Read more.
This study explores the impact of varying discharge gas compositions on the etching performance of silicon carbide (SiC) in a heptafluoroisopropyl methyl ether (HFE-347mmy)/O2/Ar plasma. SiC is increasingly favored for high-temperature and high-power applications due to its wide bandgap and high dielectric strength, but its chemical stability makes it challenging to etch. This research explores the use of HFE-347mmy as a low-global-warming-potential (GWP) alternative to the conventional high-GWP fluorinated gasses that are typically used in plasma etching. By examining the behavior of SiC etch rates and analyzing the formation of fluorocarbon films and Si-O bonds, this study provides insights into optimizing plasma conditions for effective SiC etching, while addressing environmental concerns associated with high-GWP gasses. Full article
Show Figures

Figure 1

15 pages, 5413 KiB  
Article
Silver Decoration of Vertically Aligned MoS2-MoOx Nanosheets: A Comprehensive XPS Investigation
by Khaled Al Youssef, Arkaprava Das, Jean-François Colomer, Axel Hemberg, Xavier Noirfalise and Carla Bittencourt
Materials 2024, 17(12), 2882; https://doi.org/10.3390/ma17122882 - 13 Jun 2024
Viewed by 923
Abstract
This study investigates the simultaneous decoration of vertically aligned molybdenum disulfide nanostructure (VA-MoS2) with Ag nanoparticles (NPs) and nitrogen functionalization. Nitrogen functionalization was achieved through physical vapor deposition (PVD) DC-magnetron sputtering using nitrogen as a reactive gas, aiming to induce p-type [...] Read more.
This study investigates the simultaneous decoration of vertically aligned molybdenum disulfide nanostructure (VA-MoS2) with Ag nanoparticles (NPs) and nitrogen functionalization. Nitrogen functionalization was achieved through physical vapor deposition (PVD) DC-magnetron sputtering using nitrogen as a reactive gas, aiming to induce p-type behavior in MoS2. The utilization of reactive sputtering resulted in the growth of three-dimensional silver structures on the surface of MoS2, promoting the formation of silver nanoparticles. A comprehensive characterization was conducted to assess surface modifications and analyze chemical and structural changes. X-ray photoelectron spectroscopy (XPS) showed the presence of silver on the MoS2 surface. Scanning electron microscopy (SEM) confirmed successful decoration with silver nanoparticles, showing that deposition time affects the size and distribution of the silver on the MoS2 surface. Full article
Show Figures

Figure 1

Back to TopTop