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Micromachines
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Feature Reviews in Micromachines 2024
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Feature Reviews in Micromachines 2024

A special issue of Micromachines (ISSN 2072-666X).

Deadline for manuscript submissions: 31 December 2024 | Viewed by 9301

Special Issue Editors

Prof. Dr. Ai-Qun Liu

E-Mail Website
Guest Editor
1. Department of Electrical and Electronic Engineering, The Hong Kong Polytechnic University, Hong Kong, China
2. School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Singapore
Interests: NEMS/MEMS; optofluidics; metasurface; nanophotonics
Special Issues, Collections and Topics in MDPI journals
Dr. Mehmet Remzi Dokmeci

grade E-Mail Website
Guest Editor
Terasaki Institute for Biomedical Innovation, 1018 Westwood Blvd, Los Angeles, CA 90024, USA
Interests: bio-micro-electro-mechanical systems (BioMEMS); biomedical and implantable devices; biosensors; organs-on-a-chip; micro- and nanosensors for monitoring organs-on-a-chip; flexible electronics and sensors for wound healing; packaging and encapsulation of implantable devices; biomaterials; biofabrication
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Many advances have been made in recent years in the fields of micromachines and microtechnology, and we believe that a state-of-the-art review of existing works will be a great reference for students, researchers and lecturers in both research and teaching related to micromachines. This Special Issue aims to collect high-quality review papers that include a brief retrospective overview and a broad state-of-the-art review of the topics within the scope of micromachines.

The reviews will be published as fully open access after peer review to benefit both authors and readers. You are welcome to send short proposals for reviews to our Editorial Office ([email protected]) for evaluation before submission.

Prof. Dr. Ai-Qun Liu
Dr. Mehmet Remzi Dokmeci
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

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  • Greater discoverability: Special Issues support the reach and impact of scientific research. Articles in Special Issues are more discoverable and cited more frequently.
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Further information on MDPI's Special Issue polices can be found here.

Related Special Issue

Published Papers (3 papers)

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Review

23 pages, 6709 KiB  
Review
High-Precision Chromatic Confocal Technologies: A Review
by Jingwen Li, Rui Ma and Jiao Bai
Micromachines 2024, 15(10), 1224; https://doi.org/10.3390/mi15101224 - 30 Sep 2024
Cited by 1 | Viewed by 1126
Abstract
Chromatic confocal technology is widely used for precise, steady, and efficient displacement measurement in many industrial fields. It employs the confocal and dispersion principles to encode axial positions with the wavelengths of the reflected broad spectrum. The typical chromatic confocal sensor includes a [...] Read more.
Chromatic confocal technology is widely used for precise, steady, and efficient displacement measurement in many industrial fields. It employs the confocal and dispersion principles to encode axial positions with the wavelengths of the reflected broad spectrum. The typical chromatic confocal sensor includes a light source, a dispersion objective, conjugate pinholes, and a spectral detection device. This study offers an overview of the current research on chromatic confocal technology. Because of its good performance in displacement detection, chromatic confocal technology has been widely used in contour measurement, biomedical imaging, and thickness measurements, as part of global and professional research. Due to its structural flexibility, it is also easily integrated into industrial equipment for in-machine and online profile measurements. It holds significant potential for future applications in industrial manufacturing and scientific research. However, there are also some challenges to be explored in terms of the broadband light source, dispersive optics design, and the balance between speed and accuracy in signal processing. Full article
(This article belongs to the Special Issue Feature Reviews in Micromachines 2024)
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57 pages, 2461 KiB  
Review
Microfluidic Applications in Prostate Cancer Research
by Kailie Szewczyk, Linan Jiang, Hunain Khawaja, Cindy K. Miranti and Yitshak Zohar
Micromachines 2024, 15(10), 1195; https://doi.org/10.3390/mi15101195 - 27 Sep 2024
Viewed by 1345
Abstract
Prostate cancer is a disease in which cells in the prostate, a gland in the male reproductive system below the bladder, grow out of control and, among men, it is the second-most frequently diagnosed cancer (other than skin cancer). In recent years, prostate [...] Read more.
Prostate cancer is a disease in which cells in the prostate, a gland in the male reproductive system below the bladder, grow out of control and, among men, it is the second-most frequently diagnosed cancer (other than skin cancer). In recent years, prostate cancer death rate has stabilized and, currently, it is the second-most frequent cause of cancer death in men (after lung cancer). Most deaths occur due to metastasis, as cancer cells from the original tumor establish secondary tumors in distant organs. For a long time, classical cell cultures and animal models have been utilized in basic and applied scientific research, including clinical applications for many diseases, such as prostate cancer, since no better alternatives were available. Although helpful in dissecting cellular mechanisms, these models are poor predictors of physiological behavior mainly because of the lack of appropriate microenvironments. Microfluidics has emerged in the last two decades as a technology that could lead to a paradigm shift in life sciences and, in particular, controlling cancer. Microfluidic systems, such as organ-on-chips, have been assembled to mimic the critical functions of human organs. These microphysiological systems enable the long-term maintenance of cellular co-cultures in vitro to reconstitute in vivo tissue-level microenvironments, bridging the gap between traditional cell cultures and animal models. Several reviews on microfluidics for prostate cancer studies have been published focusing on technology advancement and disease progression. As metastatic castration-resistant prostate cancer remains a clinically challenging late-stage cancer, with no curative treatments, we expanded this review to cover recent microfluidic applications related to prostate cancer research. The review includes discussions of the roles of microfluidics in modeling the human prostate, prostate cancer initiation and development, as well as prostate cancer detection and therapy, highlighting potentially major contributions of microfluidics in the continuous march toward eradicating prostate cancer. Full article
(This article belongs to the Special Issue Feature Reviews in Micromachines 2024)
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36 pages, 9951 KiB  
Review
Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography
by Muhammad Waleed Hasan, Laura Deeb, Sergei Kumaniaev, Chenglu Wei and Kaiying Wang
Micromachines 2024, 15(9), 1122; https://doi.org/10.3390/mi15091122 - 31 Aug 2024
Viewed by 6260
Abstract
Extreme ultraviolet lithography (EUVL) is a leading technology in semiconductor manufacturing, enabling the creation of high-resolution patterns essential for advanced microelectronics. This review highlights recent progress in inorganic metal-oxide-based photoresists, with a focus on their applications in EUVL. The unique properties of zinc-based, [...] Read more.
Extreme ultraviolet lithography (EUVL) is a leading technology in semiconductor manufacturing, enabling the creation of high-resolution patterns essential for advanced microelectronics. This review highlights recent progress in inorganic metal-oxide-based photoresists, with a focus on their applications in EUVL. The unique properties of zinc-based, tin–oxygen, and IVB group inorganic photoresists are examined, showcasing their enhanced chemical reactivity and precise patterning capabilities. Key advancements include the development of zinc oxide and tin oxide nanoparticles, which demonstrate significant improvements in photon absorption and solubility under extreme ultraviolet exposure. Additionally, the review delves into the photochemical reactions of tin–oxygen clusters and the influence of various ligands on film density and cross-linking. The findings suggest that these inorganic photoresists not only improve photolithographic performance but also hold potential for broader applications, such as pyroelectric infrared sensors and 3D printing. Future research directions are outlined, including the optimization of process parameters, the exploration of new ligand and metal combinations, and the evaluation of the environmental benefits of inorganic photoresists over traditional organic ones. These advancements are poised to further enhance the resolution and patterning capabilities required for next-generation semiconductor devices. Full article
(This article belongs to the Special Issue Feature Reviews in Micromachines 2024)
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