Topic Editors

Institute for Microelectronics and Microsystems—CNR, Via Del Fosso del Cavaliere 100, 00133 Rome, Italy
Department of Engineering and Aviation Sciences, University of Maryland Eastern Shore, Princess Anne, MD, USA

MEMS Sensors and Resonators, 2nd Edition

Abstract submission deadline
31 October 2026
Manuscript submission deadline
31 December 2026
Viewed by
875

Topic Information

Dear Colleagues,

In recent years, microelectromechanical systems (MEMSs) have seen significant development and revolutionized the functionalities of many systems in chemical, biological, and physical applications. Thanks to the increased reliability and adaptability of MEMS devices, MEMS technology has the potential to create new opportunities in many miniaturization applications. MEMS sensors can be found everywhere, from electronic appliances to medical diagnostics, due to their compact size and reliable performance. MEMS resonators have also been the subject of significant research and commercial interest and are widely used in applications including sensing, timing applications, filtering, etc.

Following on from the success of the initial Topic on “MEMS Sensors and Resonators”, we are pleased to launch the second edition. This Topic aims to highlight the latest developments, emerging challenges, and innovative applications in MEMS-based sensors and resonators.

In this Topic, original research articles and reviews are welcome. Research areas may include (but are not limited to) the following:

  • Microfabrication technology;
  • Design of novel MEMS sensors;
  • Modeling of MEMS systems;
  • Flexible MEMS sensors;
  • BioMEMS sensors;
  • Fluidic MEMS;
  • Acoustic wave-based sensors and resonators;
  • Microresonators;
  • Pressure sensors;
  • Inertial measurement unit.

We look forward to receiving your contributions.

Dr. Fabio Di Pietrantonio
Dr. Lanju Mei
Topic Editors

Keywords

  • MEMS sensors
  • MEMS resonators
  • MEMS technology
  • miniaturization applications
  • design of novel MEMS sensors
  • modeling of MEMS systems
  • flexible MEMS sensors
  • BioMEMS sensors
  • fluidic MEMS
  • microresonators
  • microfabrication
  • pressure sensors
  • inertial measurement unit

Participating Journals

Journal Name Impact Factor CiteScore Launched Year First Decision (median) APC
Applied Sciences
applsci
2.5 6.1 2011 16 Days CHF 2400 Submit
Electronics
electronics
2.6 7.0 2012 16.4 Days CHF 2400 Submit
Eng
eng
2.4 4.1 2020 18 Days CHF 1400 Submit
Micromachines
micromachines
3.0 7.1 2010 16.8 Days CHF 2100 Submit
Nanomanufacturing
nanomanufacturing
- - 2021 23.5 Days CHF 1000 Submit
Sensors
sensors
3.5 9.4 2001 17.8 Days CHF 2600 Submit

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Published Papers (2 papers)

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27 pages, 3877 KB  
Article
Reliability Assessment of MEMS Gyroscopes via Dual-Mechanism Synergistic Degradation: A Generalized Linear Model with Physics-Informed Wiener Processes
by Pengbin Yang, Zhen Liu, Yuhang Liang, Xinfeng Guo and Hang Geng
Sensors 2026, 26(12), 3774; https://doi.org/10.3390/s26123774 (registering DOI) - 12 Jun 2026
Viewed by 215
Abstract
As the core sensor of inertial measurement units, the reliability of Micro-Electro-Mechanical Systems (MEMS) gyroscopes is critical for long-term navigation and motion control applications. To bridge the mechanism-data gap in MEMS multi-mechanism degradation modeling, this paper proposes a physics-informed dual-indicator reliability assessment framework [...] Read more.
As the core sensor of inertial measurement units, the reliability of Micro-Electro-Mechanical Systems (MEMS) gyroscopes is critical for long-term navigation and motion control applications. To bridge the mechanism-data gap in MEMS multi-mechanism degradation modeling, this paper proposes a physics-informed dual-indicator reliability assessment framework based on Wiener processes. Two degradation indicators under consideration are frequency-related degradation caused by stiffness degradation and Q-factor degradation caused by damping degradation, for which corresponding physics-embedded stochastic degradation models are formulated. The two indicators are normalized and fused through a generalized weighted limit state function, where failure is defined as gyroscope-level performance failure. Closed-form reliability expressions are derived for linear limit states, while Monte Carlo simulation is used for nonlinear cases. Reduced-order multiphysics simulation cases, including a double-ended fixed beam and a cantilevered MEMS mass block, are used to demonstrate the mechanism-to-indicator-to-reliability modeling procedure. The results show that the proposed dual-indicator framework provides more balanced reliability assessment than single-indicator analysis under the simulation setting. The proposed method offers an alternative mechanism-informed approach for reliability analysis and lifetime prediction of other MEMS devices. Full article
(This article belongs to the Topic MEMS Sensors and Resonators, 2nd Edition)
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12 pages, 4198 KB  
Article
Simulation Analysis and Characteristic Research of High-Performance SAW Devices with Trapezoidal Piezoelectric Structures
by Zhipeng Ma, Shijun He, Zhangrui Duan, Lishuang Liu, Jing Zeng and Feng Li
Micromachines 2026, 17(6), 705; https://doi.org/10.3390/mi17060705 - 9 Jun 2026
Viewed by 145
Abstract
The electromechanical coupling factor (K2) is one of the key parameters characterizing the performance of surface acoustic wave (SAW) devices. Conventional SAW structures suffer from a spatial mismatch between mechanical energy and electric fields, which severely limits improvements in K [...] Read more.
The electromechanical coupling factor (K2) is one of the key parameters characterizing the performance of surface acoustic wave (SAW) devices. Conventional SAW structures suffer from a spatial mismatch between mechanical energy and electric fields, which severely limits improvements in K2. To address this limitation, this paper proposes a novel microstructure based on trapezoidal etching of the piezoelectric layer. First, an Al/ZnO/Si trapezoidal etching model was established for simulation studies. The results show that trapezoidal etching reduces mechanical energy leakage and enhances the spatial overlap with electric fields. Subsequently, by varying the bottom width (SZnO), the variation of K2 under three etching shapes (standard trapezoidal, rectangular, and inverted trapezoidal) was investigated. The results indicate that trapezoidal etching significantly enhances K2, which gradually increases as SZnO decreases. Under the theoretical limit (SZnO = 0.1 μm), K2 reaches a maximum of 14.34%, representing a 19-fold improvement over the conventional structure. Simultaneously, the figure of merit (FOM) and insertion loss (S21) are also remarkably improved. Finally, considering practical manufacturing constraints, this paper discusses the configurations of SZnO = 0.2 μm and 0.4 μm, revealing that the performance of the SAW devices remains significantly enhanced in both cases, thereby providing a practically feasible solution for the design and fabrication of high-performance SAW devices. Full article
(This article belongs to the Topic MEMS Sensors and Resonators, 2nd Edition)
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