Table of Contents
Inorganics, Volume 5, Issue 2 (June 2017)
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Cover Story During electrodeposition, Si4+ transfers from the electrolyte into the lattice of nucleated site [...] Read more. During electrodeposition, Si4+ transfers from the electrolyte into the lattice of nucleated site via the step—edge site and terrace site ion—transfer mechanism. However, under higher deposition rates and thicker depletion layer, Si4+ has a tendency to directly deposit on top of the nucleated site. This ionically depleted region restricts the growth in the horizontal direction preventing the coalescence of adjacent growth regions forming a discontinuous layer. Pulse current electrodeposition modifies this depleted region forming continuous high strength Si films with smaller grains and good interface adhesion thus, improving the cycling stability in LIBs. By Prashant N. Kumta. View the paper.