Cu100−xCox thin films have been obtained by sputtering (x = 3, 9) and sputter gas aggregation (x = 2.5, 7.5) and subsequent annealing at 400 °C for 1 h. We have studied their structural, magnetic, and magnetotransport properties, both for t...
Magnetron sputter epitaxy (MSE) offers several advantages compared to alternative GaN epitaxy growth methods, including mature sputtering technology, the possibility for very large area deposition, and low-temperature growth of high-quality electroni...
Due to the low heat flux towards the substrate, magnetron sputter deposition offers the possibility to deposit thin films on heat sensitive materials such as fiber-reinforced polymers, also known as composite materials. Passive thermal probe measurem...
Due to its biocompatibility and advantageous electrochemical properties, platinum is commonly used in the design of biomedical devices, e.g., surgical instruments, as well as electro-medical or orthopedic implants. This article verifies the hypothesi...
Ga2O3 is a promising material in the optoelectronics and semiconductor industry. In this work, gallium oxide thin films were deposited via radio frequency (RF) sputtering, using a liquid Ga target. The reactive sputtering was carried out using differ...
Particle accelerators are powerful tools in fundamental research, medicine, and industry that provide high-energy beams that can be used to study matter and to enable advanced applications. The state-of-the-art particle accelerators are fundamentally...
The synthesis of nanoparticles by combinatorial sputtering in ionic liquids is a versatile approach for discovering new materials. Whereas the influence on nanoparticle formation of different pure ionic liquids has been addressed, the influence of (I...
High-temperature durable mirrors based on a protected silver sputter coating are attractive for secondary reflector applications in concentrated solar thermal power plants. In this paper, silver films are deposited by high-power impulse magnetron spu...
The fabrication of plasmonic nanostructures with precise geometries and scalable production remains a critical challenge for advancing light–matter interaction technologies in applications such as sensing, photonics, and thermal management. Her...
Silver films with a thickness below 50 nanometer were deposited on glass using DC magnetron sputtering. The chemical stability of the films was investigated by exposure of the film to a droplet of a HCl solution in a humid atmosphere. The affected ar...
The spectral emission data from the plasma glow of various sputtering targets containing indium oxide, zinc oxide, and tin oxide were obtained. The plasma was generated at various power and chamber pressures. These spectral data were then converted i...
Reactive dual-target DC magnetron sputtering was used to prepare In–Sn oxide thin films with a wide range of compositions. The films were subjected to annealing post-treatment at 400 °C or 500 °C for different periods of time. Compositional and struc...
Chromium–silver films with ≤ 39.2 at.% Ag were deposited by magnetron sputtering for antibacterial applications. X-ray diffraction and scanning electron microscopy analyses indicate that the films consist of Cr and Ag, and silver segregation is not o...
In preparing MoS2-based coatings by magnetron sputtering, the working pressure of the vacuum chamber directly affects the number and kinetic energy of sputtering particles, which causes a difference in coatings structure and performance. In this pape...
The use of high-power impulse magnetron sputtering (HIPIMS) to deposit chromium-based thin films on brass substrates for the purpose of corrosion-protective coating was investigated. By varying the process parameters (pulse frequency, pulse width and...
This study addresses the fabrication of flexible, heatable fabrics via the integration of globally interconnected silver nanowires (Ag NWs) with sputter-deposited silver atoms. Conventional heatable fabrics, which utilize macroscale or nanoscale cond...
In our study, the surface of bacterial cellulose was successively modified by copper and zinc oxide nanoparticles using direct current (DC) magnetron sputtering and radio frequency (RF) reactive sputter coating techniques. The target materials, coppe...
Aluminum nitride (AlN) is a material of growing interest for power electronics, fabrication of sensors, micro-electromechanical systems, and piezoelectric generators. For the latter, the formation of nanowire arrays or nanostructured films is one of...
Porous copper films used in current collectors have been shown to improve the stability of Li-ion batteries. They can be applied in Si-based photodiodes, sensors or as microradiators. Their fabrication, however, remains a challenge. In this work, we...
We demonstrate the versatility of magnetron sputter epitaxy by achieving high-quality GaN nanorods on different substrate/template combinations, specifically Si, SiC, TiN/Si, ZrB2/Si, ZrB2/SiC, Mo, and Ti. Growth temperature was optimized on Si, TiN/...
Copper oxide is considered as an alternative electrode material for supercapacitors due to its low cost, chemical stability and high theoretical specific capacitance. In the present work, nanostructured copper oxide (CuO) films are prepared by radio-...
CuGaO2 thin films were deposited using the RF magnetron sputtering technique using Cu2O and Ga2O3 targets. The films were deposited at room temperature onto a quartz slide. The sputtering power of Cu2O remained constant at 50 W, while the sputtering...
For the best possible limit of detection of any thin film-based magnetic field sensor, the functional magnetic film properties are an essential parameter. For sensors based on magnetostrictive layers, the chemical composition, morphology and intrinsi...
Selective-area grown, catalyst-free GaN nanorod (NR) arrays grown on Si substrates have been realized using liquid-target reactive magnetron sputter epitaxy (MSE). Focused ion beam lithography (FIBL) was applied to pattern Si substrates with TiNx mas...
Amorphous thin films can be applied to increase the anti-corrosion ability of critical components. Atomized FeCrNiMoCSiB powders were hot-pressed into a disc target for R. F. magnetron sputtering on a 316L substrate to upgrade its corrosion resistanc...
Bismuth complex oxides, in particular, bismuth tungstate, have recently attracted attention as promising photocatalytic materials for water treatment processes. In the present work, photocatalytic bismuth tungstate films were prepared by pulsed direc...
Tantalum oxide thin films are deposited by DC reactive magnetron sputtering from a tantalum metallic target and argon + oxygen. The oxygen gas is pulsed during the deposition with a constant pulsing period T = 10 s, whereas the introduction time of t...
In this paper, we report the growth and material characteristics of ZnGa2O4 thin films on c-plane sapphire and Si(100) substrates by a radio-frequency magnetron sputtering. When deposited on sapphire, the ZnGa2O4 film showed a polycrystalline nature...
CuO and Al thin films were successively deposited using direct current (reactive) magnetron sputter deposition. A multilayer of five bilayers was deposited on glass, which can be ignited by heating a Ti resistive thin film. The velocity of the reacti...
Because of their reduced dimensions and mass, thin film thermocouples are a promising candidate for embedded sensors in composite materials, especially for application in lightweight and smart structures. The sensitivity of the thin film thermocouple...
This study investigated the biochemical and microbiological properties of Cotton–Copper composite materials obtained using magnetron sputtering technology. Copper particles were precisely distributed on the fabric surface, ensuring free airflow...
Two magnetron sputter targets of CoCrFeNi High-Entropy Alloy (HEA), both in equal atomic ratio, were prepared by spark plasma sintering. One of the targets was fabricated from a homogeneous HEA powder produced via gas atomisation; for the second targ...
We report a systematic study of room-temperature ferromagnetism (RTFM) in pristine MgO thin films in their amorphous and nano-crystalline states. The as deposited dc-sputtered films of pristine MgO on Si substrates using a metallic Mg target in an O2...
Here, we report on adding an important dimension to the fundamental understanding of the evolution of the thin film micro structure evolution. Thin films have gained broad attention in their applications for electro-optical devices, solar-cell techno...
In parabolic trough technology, the development of thermally and structurally stable solar coatings plays a key role in determining the efficiency, durability, and economic feasibility of tube receivers. A cermet-based solar coating is typically cons...
Polyetheretherketone (PEEK) has emerged as the material of choice for spinal fusion devices, replacing conventional materials such as titanium and its alloys due to its ability to easily overcome a lot of the limitations of traditional metallic bioma...
The coating of hollow alumino-silicate microspheres or cenospheres with thin layers of Cu by means of vibration-assisted magnetron sputtering yields a starting material with considerable potential for the production of new types of metal matrix synta...
Total sputtering yield and spatial distributions of sputtered atoms are important for numerous deposition techniques. We performed SRIM (Stopping and Range of Ions in Matter) simulations to analyze the total sputtering yield and angular distribution...
Indium tin oxide (ITO) thin films, used in many optoelectronic applications, are typically grown to a thickness of a maximum of a few hundred nanometres. In this work, the composition, microstructure and optical/electrical properties of thick ITO coa...
Porous scaffolds made of biocompatible and environmental-friendly polymer fibers with diameters in the nano/micro range can find applications in a wide variety of sectors, spanning from the biomedical field to textiles and so on. Their development ha...
This paper reports the results of an investigation of the oxidation of a sputter-deposited TiAlN hard coating in air at temperatures of 800 and 850 °C for times ranging from 15 min to 2 h. The study is focused on the role of growth defects in the...
New sensor and sensor manufacturing technologies are identified as a key factor for a successful digitalisation and are therefore economically important for manufacturers and industry. To address various requirements, a new sputter coating system has...
The joining of zirconia (ZrO2) to Ti6Al4V using Ag-Cu sputter-coated Ti brazing filler foil was investigated. Brazing experiments were performed at 900, 950, and 980 °C for 30 min under vacuum. The microstructural features of the brazed interface...
In this work, an integrated multiscale simulation of magnetron sputtering epitaxy was conducted to study the effect of sputtering pressure on the surface micro-topography of sputtered Cu/Si films. Simulation results indicated that, as the sputtering...
Vertical Schottky barrier diodes based on an ion beam sputter (IBS)-deposited β-Ga2O3 film on a single-crystalline (
This paper presents the experimental results of high-temperature sputtering of nickel targets by the Gas Injection Magnetron Sputtering (GIMS) technique. The GIMS technique is a pulsed magnetron sputtering technique that involves the generation of pl...
In the present study, (Cr,Al)N nanolayer coatings with different Al/Cr atomic ratios were deposited by magnetron sputtering on different substrate materials (H11 and D2 tool steel, alumina). To prepare the (Cr,Al)N coatings with different Al/Cr atomi...
In this study, the effect of annealing and substrate conditions on the ferroelectricity of undoped hafnium oxide (HfO2) was analyzed. Hafnium oxide was deposited on various substrates such as platinum, titanium nitride, and silicon (Pt, TiN, Si) thro...
Titanium-boron-nitrogen (Ti-B-N) thin films were deposited by RF reactive magnetron sputtering using a titanium diboride (TiB2) target in an argon + nitrogen mixture. The argon mass flow rate was kept constant, whereas that of nitrogen was pulsed dur...
Most of the molybdenum (Mo) bilayer films are deposited by direct current (DC) magnetron sputtering at the bottom and the top layer (DC/DC). However, the deposition of Mo bilayer film by radio frequency (RF) Mo bottom layer and DC Mo top layer magnet...
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